Hello, I'm an engineer in the R&D department.

I am very grateful to the company for providing me with a growth platform and allowing me to participate in this "…" training.

In the work of R&D department, I have completed the design and drawing of some projects (multiple projects), and also participated in the training and practical activities of some projects (multiple projects) during this period.

Now we mainly study the design and improvement of single-stage high-speed products. As the difficulty of the project increases, it is both a challenge and a spur to me. Only by constantly learning and improving my working methods can I be better qualified for this job. While completing the relevant drawings, we constantly optimize and improve the relevant detail design to meet the requirements of customers and improve the compatibility, operational practicability and standardization of equipment.

As a member of Infineon family, I actively participate in various training activities organized by the company, and each training can help me improve my quality and talents while working. I believe that the training of "Fei Ying Shengfa" ... "can also improve me a lot. Here, I would like to express my heartfelt thanks to the leaders and colleagues of the company. With your help, I can be handy in my work. With your help, I can put the company's development in by going up one flight of stairs.

I am keen on my work, strict with myself, correct my work position, and always maintain a modest, cautious and self-disciplined attitude. With the care and training of the leaders and the help and support of my colleagues, I will study hard, make positive progress, strive to improve myself, complete the task seriously and do my job well.

Learn from colleagues around you with an open mind at work, learn more about equipment updates in the same industry, expand knowledge, and constantly cultivate and enrich yourself. I also hope that my leaders and colleagues will give me more guidance so that I can better adapt to the needs of my work.